Evaluation of the mechanical behaviour of nanometre-thick coatings deposited using an atmospheric pressure plasma system

Surface and Coatings Technology

Volumn 203, Issue 14, 2009, Pages 2021-2029

  Twomey, Barry ^a   Byrne, Gerry ^a   Hynes, Alan ^b   O'Neill, Liam ^b   Dowling, Denis ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

^b Dow Corning Plasma Solutions   (Ireland)

Author keywords

Atmospheric pressure plasma; Fragmentation test; Nano coating; PECVD; Pin on disc; Silicon oxide

Indexed keywords

ATMOSPHERIC PRESSURE; ATMOSPHERICS; ELECTRODEPOSITION; MECHATRONICS; OXIDES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; POLYETHYLENE TEREPHTHALATES; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS; SILICONES; SUBSTRATES; SURFACE CHEMISTRY; SURFACE TENSION; TESTING; THERMOPLASTICS; WEAR RESISTANCE;

ATMOSPHERIC PRESSURE PLASMA; FRAGMENTATION TEST; NANO-COATING; PECVD; PIN-ON-DISC;

COATINGS;

EID: 62149108242     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.01.042     Document Type: Article

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