Effective annealing of ZnO thin films grown by electrochemical deposition technique

Turkish Journal of Physics

Volumn 33, Issue 1, 2009, Pages 49-56

  Coşkun, Cevdet ^a   Güney, Harun ^a   Gür, Emre ^a   Tüzemen, Sebahattin ^a  

^a ATATÜRK UNIVERSITY   (Turkey)

Author keywords

Annealing effect; Electrochemical deposition; ZnO

Indexed keywords

AERODYNAMICS; CONDUCTIVE FILMS; ELECTRODEPOSITION; FLOW OF GASES; GAS ABSORPTION; METALLIC FILMS; OPTICAL FILMS; OXIDE FILMS; OXYGEN; REDUCTION; SEMICONDUCTING ZINC COMPOUNDS; THIN FILMS; TIN; TITANIUM COMPOUNDS; ZINC; ZINC OXIDE;

ABSORPTION MEASUREMENTS; ANNEALING EFFECT; ANNEALING PROCESS; ANNEALING TEMPERATURES; ATOMIC-FORCE MICROSCOPIES; BAND GAPS; CATHODIC POTENTIALS; DIRECT BAND GAPS; ELECTROCHEMICAL DEPOSITION; GAS FLOWS; GROWTH PARAMETERS; HIGH-QUALITY FILMS; INDIUM-TIN-OXIDE SUBSTRATES; OPTICAL CHARACTERISTICS; OXYGEN GAS FLOWS; PEAK INTENSITIES; SURFACE QUALITIES; X-RAY DIFFRACTIONS; ZNO; ZNO THIN FILMS;

ANNEALING;

EID: 61849092532     PISSN: 13000101     EISSN: 13036122     Source Type: Journal    
DOI: None     Document Type: Article

References (34)

1. Y. P. Wang, W. I. Lee, T. Y. Tseng, Appl. Phys. Lett., 69, (1996), 1807.
2. K. Vanheusden, W. L. Warren, C. H. Seager, D. R. Tallant, J. A. Voigt and B. E. Gnade, J. Appl. Phys., 79, (1996), 7983.
3. S. Tüzemen and E. Gür, Optical Materials, 30, (2007), 292.
4. D. C. Reynolds, D. C. Look, B. Jogai and H. Morkoc, Solid State Commun., 101(9), (1997), 643.
5. E. W. S. Caetano, E. F. Bezerra, V. N. Freire, J. A. P. da Costa and Jr E. F. da Silva, Solid State Commun., 113(9), (2000) 539.
6. C. Coskun, D. C. Look, G. C. Farlow and J. R. Sizelove, Sem. Sci Technol., 19(6), (2004), 752.
7. D. C. Look, C. Coskun, B. Claflin and G. Farlow, Physica B, 340-342, (2003), 32.
8. Z. H. Gu and T. Z. Fahidy, J. Electrochem. Soc., 146, (1999), 156.
9. M. Izaki and T. Omi, J. Electrochem. Soc., 143, (1996), L53.
10. J. Katayama and M. Izaki, J Appl. Electrochem., 30, (2000), 855.
11. Z. H. Gu, T. Z. Fahidy, R. Hornsey and A. Nathan, Can. J. Chem., 75, (1997), 1439.
12. J. R. Vilche, K. Juttner, W. J. Lorenz, W. Kautek, W. Paatsch, M. H. Dean and U. Stimming, J. Electrochem. Soc., 136, (1989), 3773.
13. S. Peulon and D. Lincot, Adv. Mater., 8, (1996), 166.
14. S. Peulon and D. Lincot, J Electrochem. Soc., 143, (1998), 864.
15. T. Pauporte and D. Lincot, Appl. Phys. Lett., 75(24), (1999), 3817.
16. M. Izaki and T. Omi, Appl. Phys. Lett., 68, (1996), 2439.
17. T. Pauporte and D. Lincot, Electrochimica Acta, 45, (2000), 3345.
18. Y. F. Gao, M. Nagai, Y. Masuda, F. Sato and K. Koumoto, J. Cryst. Growth, 286, (2006), 445.
19. B. Lin, Z. Fu, Y. Jia and G. Liao, J Electrochem. Soc., 148, (2001), G110.
20. T. Yamamato, T. Shiosaki and A. Kawabata, J Appl. Phys., 52, (1980), 3113.
21. J. Weng, Y. Zhang, G. Han, Y. Zhang, L. Xu, J. Xu, X. Huang and K. Chen, Thin Solid Films, 478, (2005), 25.
22. Joint Committee on Powder Diffraction Standards 1990 Set:36 No: 1451 Swarthmore PA.
23. Hammond C., The Basics of Crystallography and Diffraction, Second Edition, Oxford University Press, New York, (2001).
24. H. C. Ong, A. X. E. Zhu, G. T. Du, Appl. Phys. Lett., 80(6), (2002), 941.
25. H. Giefers, F. Porsch, G. Wortmann, Solid State Ionics, 176, (2005), 199.
26. T. Yildirim, E. Gür, S. Tüzemen, V. Bilgin, S. Kose, F. Atay, I. Akyüz, Physica E, 27, (2005), 290.
27. N. Bouhssira, S. Abed, E. Tomasella, J. Cellier, A. Mosbah, M. S. Aida, M. Jacquet, Appl. Surf. Sci., 252, (2006), 5594.
28. S. Tüzemen, E. Gür, T. Yildirim, G. Xiong and R. T. Williams., J Appl. Phys., 100(10), (2006), 103513.
29. G. Ciobanu, G. Carja, G. Apostolescu and I. Taraboanta, Superlattices Microstruct., 39, (2006), 328.
30. E. A. Dalchiele, P. Giorgi, R. E. Marotti, F. Martin, J. R. Ramos-Barrodo, R. Ayouci and D. Leinen, Sol. Energ. Mat Sol. C., 70, (2001), 245.
31. C. Coskun, N. Gedik and E. Balci, Semicond. Sci. Technol., 21(12), (2006), 1656.
32. S. W. Xue, X. T. Zu, W. L. Zhou, H. X. Deng, X. Xiang, L. Zhang, H. Deng, J. Alloy Compd., (2007) (in press).
33. G. Zou, W. Chen, R. Liu, Z. Xu, Mater. Lett., 61, (2007), 4305.
34. R. Hong, J. Shao, H. He and Z. Fan, J. Cryst. Growth, 284, (2005), 347.