Electrochemical deposition and characterization of wide band semiconductor ZnO thin film

Thin Solid Films

Volumn 478, Issue 1-2, 2005, Pages 25-29

  Weng, Jian ^a   Zhang, Yongjun ^a,b   Han, Guanqi ^a   Zhang, Yu ^a   Xu, Ling ^a   Xu, Jun ^a   Huang, Xinfan ^a   Chen, Kunji ^a  

^a NANJING UNIVERSITY   (China)

^b JILIN NORMAL UNIVERSITY   (China)

Author keywords

Diffraction; Electrochemical deposition; Optical properties; Zinc oxide

Indexed keywords

ANNEALING; DIFFRACTION; ELECTRIC POTENTIAL; GRAIN SIZE AND SHAPE; HEAT TREATMENT; INDIUM COMPOUNDS; MORPHOLOGY; OPACITY; OPTICAL PROPERTIES; SEMICONDUCTOR MATERIALS; SOLUTIONS; THIN FILMS; ZINC OXIDE;

ABSORPTION ENERGY; BAND GAPS; DIFFRACTION PATTERNS; INDIUM TIN OXIDE (ITO);

ELECTRODEPOSITION;

EID: 14544280132     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.047     Document Type: Article

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