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Volumn 5349 LNCS, Issue , 2009, Pages 31-41

Design and evaluation of mixed 3T-4T FinFET stacks for leakage reduction

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EFFECT TRANSISTORS; INTEGRATED CIRCUITS; TIME MEASUREMENT;

EID: 61649111219     PISSN: 03029743     EISSN: 16113349     Source Type: Book Series    
DOI: 10.1007/978-3-540-95948-9_4     Document Type: Conference Paper
Times cited : (2)

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    • Fried, D.M., et al: A Fin-type independent-double-gate NFET. Device Research Conference, 45-46 (2003)
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  • 5
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    • Tschanz, J.1
  • 8
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    • Liu, Y.X., et al.: Cointegration of high-performance tied-gate three-terminal FinFETs and variable threshold-voltage independent-gate four-terminal FinFETs with asymmetric gate-oxide thicknesses. IEEE Electron Device Letters 28, 517-519 (2007)
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    • Liu, Y.X.1
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.