Atomic-level stress calculation and two potentials for critical conditions of deposition process

Crystal Growth and Design

Volumn 8, Issue 4, 2008, Pages 1191-1199

  Hong, Zheng Han ^a   Hwang, Shun Fa ^a   Fang, Te Hua ^b  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL FORMOSA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 61549091560     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg070584h     Document Type: Article

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