Origin of ultralow permittivity in polyimide/mesoporous silicate nanohybrid films with high resistivity and high breakdown strength

Journal of Applied Physics

Volumn 105, Issue 4, 2009, Pages

  Dang, Zhi Min ^a   Ma, Lan Jie ^a   Zha, Jun Wei ^a   Yao, Sheng Hong ^a   Xie, Dan ^b   Chen, Qiang ^c   Duan, Xue ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

^b TSINGHUA UNIVERSITY   (China)

^c BEIJING INSTITUTE OF GRAPHIC COMMUNICATION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; ELECTRIC BREAKDOWN; ELECTRON TRANSITIONS; GARNETS; MAXWELL EQUATIONS; PERMITTIVITY; POLYIMIDES; POLYMERS; SILICATES;

ADVANCED DIELECTRIC MATERIALS; AIR GAPS; HIGH BREAKDOWNS; HIGH CONCENTRATIONS; HIGH RESISTIVITIES; HYBRID FILMS; INTERFACIAL POLARIZATIONS; K VALUES; MAXWELL-GARNETT; MESOPOROUS SILICATES; NANO SIZES; NANO-HYBRID FILMS; NANOHYBRID; THERMAL STABILITIES; ULTRA-LOW DIELECTRICS; ULTRA-LOW-K; VOLUME RESISTIVITIES;

NANOSTRUCTURED MATERIALS;

EID: 61449215235     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3074102     Document Type: Article

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