Effect of pulse frequency on the ion fluxes during pulsed dc magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages 282-286

  Rahamathunnisa, M ^a   Cameron, D C ^a  

^a LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; MAGNETRONS; MASS SPECTROMETRY; NITRIDES; VOLTAGE REGULATORS;

CHROMIUM NITRIDES; DEAD TIME; EFFECT OF PULSE; ENERGY-RESOLVED MASS SPECTROMETRIES; ION DENSITIES; ION ENERGIES; ION FLUXES; METAL FLUXES; NEGATIVE VOLTAGES; POSITIVE VOLTAGES; PULSE FREQUENCIES; PULSED DC-MAGNETRON SPUTTERING; PULSED SPUTTERING; PULSED-DC; SIMPLE MODELS; TARGET VOLTAGES;

IONS;

EID: 61449208918     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3072513     Document Type: Article

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