Comparison of the operating characteristics of an opposed target magnetron using ferromagnetic and non-ferromagnetic targets

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 644-648

  Moiseev, Tamara ^a   Cameron, David C ^b  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

Ferromagnetic; Magnetron; Pulsed; Sputtering

Indexed keywords

ARGON; COPPER; CURRENT VOLTAGE CHARACTERISTICS; EMISSION SPECTROSCOPY; FERROMAGNETIC MATERIALS; IONIZATION; PLASMAS; PRESSURE EFFECTS; STEEL;

OPTICAL EMISSION SPECTROSCOPY; TARGET MAGNETRON;

MAGNETRON SPUTTERING;

COATING;

EID: 24644459351     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.046     Document Type: Article

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