Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

Thin Solid Films

Volumn 517, Issue 10, 2009, Pages 3039-3042

  Schropp, R E I ^a   van der Werf, C H M ^a   Verlaan, V ^a   Rath, J K ^a   Li, H ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Flexible solar cells; Hot wire chemical vapor deposition; Silicon nitride; Solar cells; Thin film semiconductor deposition

Indexed keywords

CELLS; CYTOLOGY; DEPOSITION; DEPOSITION RATES; ELECTRIC CONDUCTIVITY; ELECTRODEPOSITION; NONMETALS; PHOTOVOLTAIC CELLS; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR MATERIALS; SILICON NITRIDE; SILICON WAFERS; SOLAR CELLS; THIN FILM DEVICES; THIN FILMS; VAPORS; WIRE;

ACTIVE LAYERS; APERTURE AREAS; CATALYTIC CHEMICAL VAPOR DEPOSITIONS; CELL EFFICIENCIES; DENSE MATERIALS; EXPERIMENTAL LABORATORIES; FLEXIBLE SOLAR CELLS; FLEXIBLE THIN FILM SOLAR CELLS; HIGH DEPOSITION RATES; HOT WIRE CHEMICAL VAPOR DEPOSITION; INITIAL EFFICIENCIES; MULTIJUNCTION; NANO-CRYSTALLINE; NC-SI:H; POLYCRYSTALLINE-SI; RECENT PROGRESS; ROLL TO ROLLS; SEMICONDUCTOR SILICONS; SILICON NITRIDE DEPOSITIONS; SINGLE JUNCTIONS; TANDEM MODULES; THIN FILM SEMICONDUCTOR DEPOSITION; THIN FILM SOLAR CELLS; THIN-FILM SILICONS; TRIPLE JUNCTION CELLS; ULTRA FASTS;

CHEMICAL VAPOR DEPOSITION;

EID: 61449099432     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.101     Document Type: Article

References (23)

1. Honda N., Masuda A., and Matsumura H. J. Non-Cryst. Solids 266-269 (2000) 100
2. Nelson B.P., Xu Y., Mahan A.H., Williamson D.L., and Crandall R.S. Mater. Res. Soc. Symp. Proc. 609 (2000) A22.8.1
3. Ansari S.G., Umemoto H., Morimoto T., Yoneyame K., Izumi A., Masuda A., and Matsumura H. Thin Solid Films 501 (2006) 31
4. Verlaan V., Houweling Z.S., van der Werf C.H.M., Goldbach H.D., and Schropp R.E.I. MRS Proc. 910 (2006) A3.3
5. Verlaan V., van der Werf C.H.M., Houweling Z.S., Dekkers H.F.W., Romijn I.G., Weeber A.W., Goldbach H.D., and Schropp R.E.I. Prog. Photovolt.: Res. Appl. 15 (2007) 563
6. Schropp R.E.I. Jpn. J. Appl. Phys. 45 (2006) 4309
7. Verlaan V., van der Werf C.H.M., Arnoldbik W.M., Goldbach H.D., and Schropp R.E.I. Phys. Rev. B 73 (2006) 195333
8. Schropp R.E.I., Nishizaki S., Houweling Z.S., Verlaan V., van der Werf C.H.M., and Matsumura H. Solid State Electron. 52 (2008) 427
9. Claassen W.A.P., Valkenburg W.G.J.M., v.d. Wijgert W.M., and Willemsen M.F.C. Thin Solid Films 129 (1985) 239
10. Masuda A., Totsuka M., Oku T., Hattori R., and Matsumuram H. Vacuum 74 (2004) 525
11. Takano M., Niki T., Heya A., Osono T., Yonezawa Y., Minamikawa T., Muroi S., Minami S., Masuda A., Umemoto H., and Matsumura H. Jpn. J. Appl. Phys. 44 6A (2005) 4098
12. Vetterl O., Finger F., Carius R., Hapke P., Houben L., Kluth O., Lambertz A., Mück A., Rech B., and Wagner H. Sol. Energy Mater. Sol. Cells 62 (2000) 97
13. Matsumura H. J. Appl. Phys. 65 (1989) 4396
14. Mahan A.H., Carapella J., Nelson B.P., Crandall R.S., and Balberg I. J. Appl. Phys. 69 (1991) 6728
15. Feenstra K.F., Schropp R.E.I., and van der Weg W.F. J. Appl. Phys. 85 (1999) 6843
16. Schropp R.E.I., van Veen M.K., van der Werf C.H.M., Williamson D.L., and Mahan A.H. Proc. 19th European Photovoltaic Solar Energy Conf., Paris (France) (2004) 1526
17. Strengers J.J.H., Rubinelli F.A., Rath J.K., and Schropp R.E.I. Thin Solid Films 501 (2006) 291
18. van Veen M.K., and Schropp R.E.I. Appl. Phys. Lett. 82 (2003) 287
19. Stolk R.L., Li H., Franken R.H., Strengers J.J.H., van der Werf C.H.M., Rath J.K., and Schropp R.E.I. J. Non-Cryst. Solids 352 (2006) 1933
20. Hamers E.A.G., van den Donker M.N., Stannowski B., Schlatmann R., and Jongerden G.J. Plasma Process. Polym. 4 (2007) 275
21. Stolk R..L., Li H., van der Werf C.H.M., and Schropp R.E.I. Thin Solid Films 501 (2006) 256
22. Franken R.H., Yu H., Liu Y., Stolk R.L., van der Werf C.H.M., Rath J.K., and Schropp R.E.I. Proc. 20th European Photovoltaic Solar Energy Conf., Barcelona (Spain) (2005) 1588
23. Knoesen D., Arendse C., Halindintwali S., and Muller T. Thin Solid Films 516 (2008) 822