Hot-wire chemical vapor-deposited microcrystalline silicon in single and tandem n-i-p solar cells

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1933-1936

  Stolk, R L ^a   Li, H ^a   Franken, R H ^a   Strengers, J J H ^a   van der Werf, C H M ^a   Rath, J K ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Chemical vapor deposition; Devices; Films and coatings; Microcrystallinity; Microstructure; Photovoltaics; Solar cells

Indexed keywords

CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; CRYSTALLIZATION; PHOTOVOLTAIC CELLS; SOLAR CELLS;

FILMS AND COATINGS; MICROCRYSTALLINITY; PHOTOVOLTAICS;

SILICON;

EID: 33744513030     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.11.134     Document Type: Article

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