Ferroelectric properties of SrBi2Ta2O9 thin films on Si (100) with a LaZrO x buffer layer

Journal of Electroceramics

Volumn 22, Issue 1-3, 2009, Pages 276-280

  Im, Jong Hyun ^a   Jeon, Ho Seung ^a   Kim, Joo Nam ^a   Kim, Dong Won ^a   Park, Byung Eun ^a   Kim, Chul Ju ^a  

^a University of Seoul   (South Korea)

Author keywords

LaZrO x; MFIS; Sol gel; SrBi2Ta2O9

Indexed keywords

AMORPHOUS MATERIALS; BUFFER LAYERS; DATA STORAGE EQUIPMENT; FERROELECTRICITY; GELATION; GELS; HYSTERESIS; PHOTORESISTS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SOL-GEL PROCESS; SOL-GELS; SOLS; SURFACE ROUGHNESS; TANTALUM; WINDOWS;

AMORPHOUS PHASE; ANNEALING TEMPERATURES; C-V CHARACTERISTICS; CLOCKWISE HYSTERESIS LOOPS; CRYSTALLINE PHASE; FERROELECTRIC PROPERTIES; LAZRO X; LEAKAGE CURRENT DENSITIES; MEMORY WINDOWS; METAL-FERROELECTRIC-INSULATOR-SEMICONDUCTOR STRUCTURES; MFIS; P-TYPE SI; POLYCRYSTALLINE PHASE; ROOT-MEAN-SQUARED; SBT FILMS; SI(1 0 0 ); SOL-GEL; SOL-GEL TECHNIQUES; SRBI2TA2O9;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 60649111369     PISSN: 13853449     EISSN: 15738663     Source Type: Journal    
DOI: 10.1007/s10832-007-9366-1     Document Type: Article

References (19)

1. J.F. Scott C.A. Paz de Araujo 1989 Science 246 14004
2. K. Takahashi K. Aizawa H. Ishiwara 2006 Jpn. J. Appl. Phys 45 5098
3. Y. Shichi S. Tanimoto T. Goto K. Kuroiwa Y. Tarui 1994 Jpn. J. Appl. Phys 33 5172
4. B.-E. Park K. Takahashi H. Ishiwara 2005 J. Kor. Phys. Soc 46 346
5. Y.-U. Song J.-S. Park J.-W. Yoon G.-G. Lee B.-E. Park C.-J. Kim Y.-S. Choi J.-H. Koh 2006 Int. Ferroeletr 84 203
6. B.-E. Park K. Takahashi H. Ishiwara 2004 Appl. Phys. Lett 85 4448
7. B.-E. Park H. Ishiwara 2003 J. Kor. Phys. Soc 42 S1149
8. M. Takahashi S. Sakai 2005 Jpn. J. Appl. Phys 44 L800
9. H. Okuyucu E. Celik M.K. Ramazanoglu T. Akin I.H. Mutlu W. Sigmund J.E. Crow Y.S. Hascicek 2001 IEEE Trans. Appl. Supercond 11 2889
10. J.W. Seo J. Fompeyrine A. Guiller G. Norga C. Marchiori H. Siegwart J.-P. Locquet 2003 Appl. Phys. Lett 83 5211
11. S. Tirumala A.C. Rastogi S.B. Desu 2000 J. Electroceram. 5 7
12. W.L. Chang J.L. He 2005 J. Electrocerm. 13 35
13. W. Jo 2004 Appl. Phys. A: Mater. Sci. Process 72 81
14. A.Z. Simões A.H.M. Gonzalez C.S. Riccardi E.C. Souza F. Moura M.A. Zaghete E. Longo J.A. Verela 2004 J. Electroceram. 13 65
15. E.F. Dudnik V.M. Duda A.I. Kushnerov 2001 Phys. Solid State 43 2280
16. H.S. Choi E.H. Kim I.H. Choi Y.T. Kim J.H. Choi J.Y. Lee 2001 Thin Solid Films 388 226
17. H. Kido S. Komarneni R. Roy 1991 J. Am. Ceram. Soc 74 422
18. H. Hu C. Zhu Y.F. Lu Y.H. Wu T. Liew M.F. Li B.J. Cho W.K. Choi N. Yakovlev 2003 J. Appl. Phys. 94 551
19. M. Nagata D.P. Vijay X. Zhang S.B. Desu 1996 Phys. Stat. Sol 157 75