Effect of oxygen plasma on growth, structure and ferroelectric properties of SrBi2Ta2O9 thin films formed by pulsed laser ablation technique

Journal of Electroceramics

Volumn 5, Issue 1, 2000, Pages 7-20

  Tirumala, S ^a   Rastogi, A C ^a,b   Desu, S B ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELECTRODES; FERROELECTRICITY; FILM GROWTH; ION BOMBARDMENT; LASER ABLATION; LASER PULSES; NUCLEATION; PLASMAS; STRONTIUM COMPOUNDS;

FILM ORIENTATION; OXYGEN PLASMA; PULSED LASER ABLATION;

THIN FILMS;

EID: 0034249603     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1009929109536     Document Type: Article

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