Low-temperature sterilization using gas plasmas: A review of the experiments and an analysis of the inactivation mechanisms

International Journal of Pharmaceutics

Volumn 226, Issue 1-2, 2001, Pages 1-21

  Moisan, M ^a   Barbeau, J ^a   Moreau, S ^b   Pelletier, J ^c   Tabrizian, M ^b   Yahia, L'H ^b  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^c CNRS   (France)

Author keywords

Etching; Gas plasma; Photodesorption; Spore; Sterilization; Survival curve; UV irradiation

Indexed keywords

CHEMOSTERILANT; OXYGEN; OXYGEN RADICAL; RADICAL; VOLATILE AGENT;

ARTICLE; ATOMIC PARTICLE; COMBUSTION; DESORPTION; DEVICE; EROSION; GAS; HEAT SENSITIVITY; INSTRUMENT STERILIZATION; INTERMETHOD COMPARISON; LOW TEMPERATURE; METHODOLOGY; MICROBIAL GENETICS; MICROORGANISM; PHOTON; PLASMA; PRION; PRIORITY JOURNAL; STOICHIOMETRY; SURVIVAL RATE; ULTRAVIOLET IRRADIATION;

EID: 0035845749     PISSN: 03785173     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0378-5173(01)00752-9     Document Type: Review

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