Sterilization of medical equipment using radicals produced by oxygen/water vapor RF plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8358-8363

  Hayashi, Nobuya ^a   Guan, Weimin ^a   Tsutsui, Shinsuke ^a   Tomari, Tetsushi ^a   Hanada, Yasushi ^b  

^a SAGA UNIVERSITY   (Japan)

^b Elquest Co Ltd   (Japan)

Author keywords

Low pressure RF plasma; Oxygen radicals; Sterilization

Indexed keywords

BACTERIA; LIGHT EMISSION; OXYGEN; STERILIZATION (CLEANING); WATER VAPOR;

LOW PRESSURE RF PLASMA; MICROBIAL DETECTION; OXYGEN RADICALS; RADICALS;

BIOMEDICAL EQUIPMENT;

EID: 34547905416     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8358     Document Type: Article

References (15)

1. C. L. Nelson and T. J. Berger: Curr. Microbiol. 18 (1989) 275.
2. V. A. Lisovskiy, S. D. Yakovin, V. D. Yegorenkov and A. G. Terent'eva: Probl. At. Sci. Technol. 1 (2000) 77.
3. A. A. Bol'shakov, B. A. Cuden, R. Mogul, M. V. V. S. Rao, S. P. Sharma and M. Meyyappan: AIAA J. (2002) 42.
4. M. .Nagatsu, F. Terashita and Y. Koide: Jpn. J. Appl. Phys. 42 (2003) L856.
5. S. Lerouge, M. R. Werttheimer, R. Marchand, M. Tabrizian and L'H. Yahia: J. Biomed. Mater. Res. 51 (2000) 128.
6. S. Hury, D. R. Vidal, F. Desor, J. Pelletier and T. Lagarde: Lett. Appl. Microbiol. 26 (1988) 417.
7. S. Moreau, M. Moisan, M. Tbrizian, J. Barbeau, J. Pelletier, A. Ricard and L'H. Yahia: J. Appl. Phys. 88 (2000) 1166.
8. D. Purevdorj, N. Igura, O. Ariyada and I. Hayakawa: Lett. Appl. Microbiol. 37 (2003) 31.
9. B. J. Park, D. H. Lee, J.-C. Park, L-S. Lee, K.-Y. Lee, S. O. Hyun, M.-S. Chun and K.-H. Chung: Phys. Plasmas 10 (2003) 4539.
10. X. Lei, Z. Rui, L. Peng, D. Li-Li and Z. Ru-Juan: Chin. Phys. 13 (2004) 913.
11. T. Akitsu, H. Ohkawa, M. Tsuji, H. Kimura and M. Kogoma: Surf. Coat. Technol. 193 (2005) 29.
12. S. P. Sharma, B. A. Cruden, M. V. V. S. Rao and A. A. Bolshakov: J. Appl. Phys. 95 (2004) 3324.
13. V. A. Khomich, I. A. Soloshenko, V. V. Tsiolko and I. L. Mikhno: Proc. Int. Congr. Plasma Physics, 1998, p. 2745.
14. I. A. Soloshenko, V. V. Tsiolko, V. A. Khomich, A. I. Shchedrin, A. V. Ryabtsev, V. Yu. Bazhenov and I. L. Mikhno: Plasma Phys. Rep. 26 (2000) 792.
15. M. Kaneko: Suishitsu Eiseigaku (Water Hygienics) (Gihodo, Tokyo, 1999) p. 340 [in Japanese].