-
1
-
-
0034408192
-
-
Soloshenko I A, Tsiolko V V, Khomich V A, Shchedrin A I, Ryabtsev A V, Bazhenov V Yu and Mikhno I L 2000 Plasma Phys. Rep. 26 792-800
-
(2000)
Plasma Phys. Rep.
, vol.26
, Issue.9
, pp. 792-800
-
-
Soloshenko, I.A.1
Tsiolko, V.V.2
Khomich, V.A.3
Shchedrin, A.I.4
Ryabtsev, A.V.5
Yu, B.V.6
Mikhno, I.L.7
-
2
-
-
33947632868
-
-
Soloshenko I A, Tsiolko V V, Khomich V A, Bazhenov V Yu, Ryabtsev A V, Shchedrin A I and Mikhno I L 2001 Proc. 15th Int. Symp. on Plasma Chemistry (Orleans, France) vol II pp 735-40
-
(2001)
Proc. 15th Int. Symp. on Plasma Chemistry
, vol.2
, pp. 735-740
-
-
Soloshenko, I.A.1
Tsiolko, V.V.2
Khomich, V.A.3
Bazhenov, V.4
Yu Ryabtsev, A.V.5
Shchedrin, A.I.6
Mikhno, I.L.7
-
4
-
-
33748879554
-
-
Gans T, Osiac M, O'Connell D, Kadetov V A, Czarnetzki U, Schwaz-Selinger T, Halfmann H and Awakowicz P 2005 Plasma Phys. Control. Fusion 47 A353-60
-
(2005)
Plasma Phys. Control. Fusion
, vol.47
-
-
Gans, T.1
Osiac, M.2
O'Connell, D.3
Kadetov, V.A.4
Czarnetzki, U.5
Schwaz-Selinger, T.6
Halfmann, H.7
Awakowicz, P.8
-
5
-
-
0035845749
-
-
Moisan M, Barbeau J, Moreau S, Pellettier J, Tabrizian M and Yahia L'H 2001 Int. J. Pharm. 226 1-21
-
(2001)
Int. J. Pharm.
, vol.226
, Issue.1-2
, pp. 1-21
-
-
Moisan, M.1
Barbeau, J.2
Moreau, S.3
Pellettier, J.4
Tabrizian, M.5
L'H, Y.6
-
6
-
-
0037277997
-
-
Philip N, Saoudi B, Crevier M C, Moisan M, Barbeau J and Pelletier J 2002 IEEE Trans. Plasma Sci. 30 1429-36
-
(2002)
IEEE Trans. Plasma Sci.
, vol.30
, Issue.4
, pp. 1429-1436
-
-
Philip, N.1
Saoudi, B.2
Crevier, M.C.3
Moisan, M.4
Barbeau, J.5
Pelletier, J.6
-
7
-
-
21144432379
-
-
Moisan M, Saoudi B, Crevier M C, Philip N, Fafard E, Barbeau J and Pelletier J 2003 Conf. Proc. 5th Int. Workshop on Microwave Discharges: Fundamentals and Applications (Greifswald, Germany) pp 210-21
-
(2003)
Conf. Proc. 5th Int. Workshop on Microwave Discharges: Fundamentals and Applications
, pp. 210-221
-
-
Moisan, M.1
Saoudi, B.2
Crevier, M.C.3
Philip, N.4
Fafard, E.5
Barbeau, J.6
Pelletier, J.7
-
8
-
-
18244430023
-
-
Ehlbeck J, Ohl A, Maas M, Krohmann U and Neumann T 2003 Surf. Coat. Technol. 174-175 493-7
-
(2003)
Surf. Coat. Technol.
, vol.174-175
, pp. 493-497
-
-
Ehlbeck, J.1
Ohl, A.2
Maas, M.3
Krohmann, U.4
Neumann, T.5
-
9
-
-
0034108982
-
-
Lerouge S, Wertheimer M R, Marchand R, Tabrizian M and Yahia L'H 2000 J. Biomed. Mater. Res. 51 128-35
-
(2000)
J. Biomed. Mater. Res.
, vol.51
, Issue.1
, pp. 128-135
-
-
Lerouge, S.1
Wertheimer, M.R.2
Marchand, R.3
Tabrizian, M.4
L'H, Y.5
-
11
-
-
20844463749
-
-
Nagatsu M, Terashita F, Nonaka H, Xu L, Nagata T and Koide Y 2005 Appl. Phys. Lett. 86 211502
-
(2005)
Appl. Phys. Lett.
, vol.86
, Issue.21
, pp. 211502
-
-
Nagatsu, M.1
Terashita, F.2
Nonaka, H.3
Xu, L.4
Nagata, T.5
Koide, Y.6
-
12
-
-
29144533412
-
-
Xu L, Terashita F, Nonaka H, Ogino A, Nagata T, Koide Y, Nanko S, Kurawaki I and Nagatsu M 2006 J. Phys. D: Appl. Phys. 39 148-52
-
(2006)
J. Phys. D: Appl. Phys.
, vol.39
, Issue.1
, pp. 148-152
-
-
Xu, L.1
Terashita, F.2
Nonaka, H.3
Ogino, A.4
Nagata, T.5
Koide, Y.6
Nanko, S.7
Kurawaki, I.8
Nagatsu, M.9
-
15
-
-
33645229855
-
-
Xu L, Liu P, Zhan R J, Wen X H, Ding L L and Nagatsu M 2006 Thin Solid Films 506-507 400-3
-
(2006)
Thin Solid Films
, vol.506-507
, pp. 400-403
-
-
Xu, L.1
Liu, P.2
Zhan, R.J.3
Wen, X.H.4
Ding, L.L.5
Nagatsu, M.6
-
16
-
-
33746883588
-
-
Boudam M K, Moisan M, Saoudi B, Popovici C, Gherardi N and Massines F 2006 J. Phys. D: Appl. Phys. 39 3494-507
-
(2006)
J. Phys. D: Appl. Phys.
, vol.39
, Issue.16
, pp. 3494-3507
-
-
Boudam, M.K.1
Moisan, M.2
Saoudi, B.3
Popovici, C.4
Gherardi, N.5
Massines, F.6
-
17
-
-
13844255021
-
-
Akitsu T, Ohkawa H, Tsuji M, Kimura H and Kogoma M 2005 Surf. Coat. Technol. 193 29-34
-
(2005)
Surf. Coat. Technol.
, vol.193
, Issue.1-3
, pp. 29-34
-
-
Akitsu, T.1
Ohkawa, H.2
Tsuji, M.3
Kimura, H.4
Kogoma, M.5
-
18
-
-
33947619429
-
-
Nagatsu M, Terashita F, Xu L, Nonaka H, Ninomiya K, Nagata T, Koide Y, Nanko S and Kurawaki I 2005 Proc. 17th Int. Symp. on Plasma Chemistry (Toronto, Canada) pp 1100-1
-
(2005)
Proc. 17th Int. Symp. on Plasma Chemistry
, pp. 1100-1101
-
-
Nagatsu, M.1
Terashita, F.2
Xu, L.3
Nonaka, H.4
Ninomiya, K.5
Nagata, T.6
Koide, Y.7
Nanko, S.8
Kurawaki, I.9
-
19
-
-
0034266772
-
-
Nagatsu M, Sano T, Takada N, Hirao T and Sugai H 2000 Japan. J. Appl. Phys. 39 L929-31
-
(2000)
Japan. J. Appl. Phys.
, vol.39
, Issue.PART 2
-
-
Nagatsu, M.1
Sano, T.2
Takada, N.3
Hirao, T.4
Sugai, H.5
|