Sterilization of Escherichia coli and MRSA using microwave-induced argon plasma at atmospheric pressure

Surface and Coatings Technology

Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 35-38

  Lee, Kwon Yong ^a   Park, Bong Joo ^b   Lee, Dong Hee ^c   Lee, In Seop ^d   Hyun, Soon O ^e   Chung, Kie Hyung ^f   Park, Jong Chul ^c  

^a Sejong University   (South Korea)

^b GIFU UNIVERSITY   (Japan)

^c Yonsei University College of Medicine   (South Korea)

^d Yonsei University   (South Korea)

^e Korea Institute of Industrial Technology   (South Korea)

^f Physico Technology Laboratory   (South Korea)

Author keywords

Atmospheric pressure; Escherichia coli; Methicillin resistant Staphylococcus aureus; Microwave induced argon plasma; Sterilization

Indexed keywords

ARGON; ATMOSPHERIC PRESSURE; ETHYLENE; FREE RADICALS; OXIDATION; PLASMA DENSITY; PLASMAS; STERILIZATION (CLEANING); TOXICITY;

ETHYLENE OXIDE (ETO) GAS; METHICILLIN-REISTANT STAPHYLOCOCCUS AUREUS (MRSA);

ESCHERICHIA COLI;

GLOW DISCHARGE CLEANING;

EID: 13844255019     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.07.034     Document Type: Article

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