Growth of vertically aligned carbon nanotubes on glass substrate at 450 °C through the thermal chemical vapor deposition method

Diamond and Related Materials

Volumn 18, Issue 2-3, 2009, Pages 307-311

  Tsai, Tsung Yen ^a   Tai, Nyan Hwa ^a   Chen, K C ^b   Lee, S H ^b   Chan, L H ^b   Chang, Y Y ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Carbon nanotubes; Co Ti binary catalyst; Glass substrate; Low temperature CVD

Indexed keywords

CARBON FILMS; CATALYSIS; CATALYST POISONING; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GLASS; GROWTH (MATERIALS); NANOCOMPOSITES; NANOTUBES; PHASE DIAGRAMS; SUBSTRATES; SYNTHESIS (CHEMICAL); TITANIUM; VAPORS;

BI-METALLIC CATALYSTS; BIMETALLIC FILMS; BINARY PHASE DIAGRAMS; CHEMICAL VAPORS; CO/TI BINARY CATALYST; GLASS SUBSTRATE; GROWING PROCESS; LOW TEMPERATURE CVD; LOW TEMPERATURES; RAPID-HEATING; SI SUBSTRATES; SPUTTERING METHODS; THERMAL CHEMICAL VAPOR DEPOSITION METHODS; VERTICALLY ALIGNED CARBON NANOTUBES;

CARBON NANOTUBES;

EID: 59649090901     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.09.001     Document Type: Article

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