Low temperature growth of multi-wall carbon nanotubes assisted by mesh potential using a modified plasma enhanced chemical vapor deposition system

Chemical Physics Letters

Volumn 349, Issue 3-4, 2001, Pages 196-200

  Kang, H S ^a   Yoon, H J ^a   Kim, C O ^a   Hong, J P ^a   Han, I T ^b   Cha, S N ^b   Song, B K ^b   Jung, J E ^b   Lee, N S ^b   Kim, J M ^b  

^a Hanyang University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001627833     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(01)01205-2     Document Type: Article

References (10)

1. Iijima S. Nature. 354:1991;56.
2. Collins P.G., Zettl A. Phys. Rev. B. 55:1997;9391.
3. Dai H., Hafner J.H., Rinzler A.G., Colbert D.T., Smalley R.E. Nature. 384:1996;147.
4. Nutzenadel C., Zuttel A., Chartouni D., Schlapbach L. Electrochem. Solid-State Lett. 2:1999.
5. Bethune D.S., Kiang C.H., de Vries M.S., Gorman G., Savoy R., Vazquez J., Beyers R. Nature. 363:1993;605.
6. Thess A., Lee R., Nicolaev P., Dai H., Petit P., Robert J., Xu C., Lee Y.H., Kim S.G., Rinzler A.G., Colbert D.T., Scuseria G.E., Tomanek D., Fisher J.E., Smalley R.E. Science. 273:1996;483.
7. Fan S., Chapline M.G., Franklin N.R., Tombler T.W., Cassell A.M., Dai H. Science. 283:1999;512.
8. Ren Z.F., Huang Z.P., Xu J.W., Wang J.H., Bush P., Siegal M.P., Provencio P.N. Science. 282:1998;1105.
9. Bower C., Zhu W., Jin S., Zhou O. Appl. Phys. Lett. 77:2000;6.
10. Chieu T.C., Dresselhaus M.S., Endo M. Phys. Rev. B. 26:1982;10530.