Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperature

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1864-1868

  Choi, Young Chul ^a   Bae, Dong Jae ^a   Lee, Young Hee ^a   Lee, Byung Soo ^a   Park, Gyeong Su ^b   Choi, Won Bong ^b   Lee, Nae Sung ^b   Kim, Jong Min ^b  

^a Chonbuk National University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CRYSTAL GROWTH; GRAIN SIZE AND SHAPE; HIGH RESOLUTION ELECTRON MICROSCOPY; LOW TEMPERATURE OPERATIONS; MICROWAVES; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

MICROWAVE PLASMAS;

NANOTUBES;

EID: 0034225033     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582437     Document Type: Article

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