Effect of substrate roughness on c -oriented AlN thin films

Journal of Applied Physics

Volumn 105, Issue 2, 2009, Pages

  Artieda, Alvaro ^a   Barbieri, Michela ^a   Sandu, Cosmin Silviu ^a   Muralt, Paul ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVES; ACOUSTICS; PLATINUM; SEMICONDUCTING SILICON COMPOUNDS; STRESSES; SUBSTRATES; THIN FILMS;

ALN; ALN FILMS; ALN THIN FILMS; AMORPHOUS SILICON LAYERS; BULK ACOUSTIC WAVE DEVICES; DIFFUSION PHENOMENON; GROWTH SUBSTRATES; INTERMEDIATE PRESSURES; MECHANICAL STRESS; RMS ROUGHNESS; SIO2 SURFACES; SPUTTER PRESSURES; SUBSTRATE ROUGHNESS; THERMALLY OXIDIZED SILICONS; X-RAY ROCKING CURVES;

AMORPHOUS SILICON;

EID: 59349089017     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3068309     Document Type: Article

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