Analysis of extreme ultraviolet microscopy images of patterned nanostructures based on a correlation method

Journal of the Optical Society of America B: Optical Physics

Volumn 25, Issue 7, 2008, Pages

  Wachulak, P W ^a,b   Brewer, C A ^a,b   Brizuela, F ^a,b   Menoni, C S ^a,b   Chao, W ^a,c   Anderson, E H ^a,c   Bartels, R A ^a,b   Rocca, J J ^a,b   Marconi, M C ^a,b  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b Engineering Research Center and Hydraulics Laboratory   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE RESOLUTION; NANOSTRUCTURES;

EXTREME ULTRAVIOLET MICROSCOPIES; FEATURE SIZES; FRESNEL ZONE PLATE; GAUSSIAN FILTERS; INDEPENDENT MEASUREMENT; ORIGINAL IMAGES; SIMULTANEOUS DETERMINATIONS; WAVELENGTH LASERS;

IMAGE ANALYSIS;

EID: 51849141927     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.25.000B20     Document Type: Conference Paper

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