The effect of glow discharge sputtering on the analysis of metal oxide films

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 64, Issue 2, 2009, Pages 155-166

  Malherbe, Julien ^a,b   Martinez, Hervé ^a   Fernández, Beatriz ^a   Pécheyran, Christophe ^a   Donard, Olivier F X ^a  

^a UNIVERSITÉ DE PAU ET DES PAYS DE L'ADOUR   (France)

^b HORIBA LTD   (Japan)

Author keywords

Atomic force microscopy (AFM); In depth profile analysis; Preferential sputtering; Radiofrequency glow discharge optical emission spectrometry (rf GD OES); Solid state speciation; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ABLATION; ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; CHROMATE COATINGS; CHROMATES; CHROMIUM; DEPTH PROFILING; ELECTRIC DISCHARGES; ELECTRON SPECTROSCOPY; EMISSION SPECTROSCOPY; FOURIER TRANSFORMS; GLOW DISCHARGES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; IRON ANALYSIS; IRON OXIDES; LASER ABLATION; LIGHT EMISSION; MASS SPECTROMETRY; METAL ANALYSIS; METALLIC COMPOUNDS; METALS; OPTICAL EMISSION SPECTROSCOPY; OPTICAL MICROSCOPY; OXIDATION; OXYGEN; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; PLASMAS; PROTECTIVE COATINGS; PULSED LASER APPLICATIONS; SECONDARY ION MASS SPECTROMETRY; SPECTROMETERS; SPECTROMETRY; SPECTRUM ANALYSIS; SURFACE MORPHOLOGY; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY (AFM); IN-DEPTH PROFILE ANALYSIS; PREFERENTIAL SPUTTERING; RADIOFREQUENCY GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRY (RF-GD-OES); SOLID-STATE SPECIATION; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS);

OXIDE FILMS;

EID: 58549115734     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2008.11.009     Document Type: Article

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