Combined depth profile analysis with SNMS, SIMS and XPS: Preferential sputtering and oxygen transport in binary metal oxide multilayer systems

Surface and Interface Analysis

Volumn 22, Issue 1-12, 1994, Pages 9-13

  Albers, Th ^a   Neumann, M ^a   Lipinsky, D ^b   Wiedmann, L ^b   Benninghoven, A ^b  

^a UNIVERSITY OF OSNABRÜCK   (Germany)

^b UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COMPOSITION EFFECTS; HAFNIUM COMPOUNDS; MASS SPECTROMETRY; MICROSCOPIC EXAMINATION; OXYGEN; PHOTOELECTRON SPECTROSCOPY; SILICA; SPUTTERING; SUBSTRATES; TITANIUM DIOXIDE; TRANSPORT PROPERTIES;

BINARY METAL OXIDE MULTILAYER SYSTEMS; COMBINED DEPTH PROFILE ANALYSIS; OXYGEN TRANSPORT; PREFERENTIAL SPUTTERING;

METALLIC SUPERLATTICES;

EID: 0028460306     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.740220105     Document Type: Article

References (11)

1. XPS and SIMS/SNMS measurements on thin metal oxide layers
2. Performance of a new ion optics for quasisimultaneous secondary ion, secondary neutral, and residual gas mass spectrometry
3. Preferential sputtering of oxides: A comparison of model predictions with experimental data