Profile control of SU-8 photoresist using different radiation sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4407, Issue , 2001, Pages 119-125

  Cui, Z ^a   Jenkins, D W K ^a   Schneider, A ^a   McBride, G ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

High aspect ratio microstructure; LIGA; MEMS; SU 8 resist

Indexed keywords

ASPECT RATIO; ELECTRON BEAMS; PHOTORESISTS; RADIATION; SYNCHROTRON RADIATION;

RADIATION SOURCES;

MICROELECTROMECHANICAL DEVICES;

EID: 0034851798     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425291     Document Type: Conference Paper

References (7)

1. Micromachining application of high resolution ultrathick photoresist
2. Fabrication process of high aspect ratio elastic and SU-8 structures for piezoelectric motor applications
3. Mask prototyping for ultra-deep x-ray lithography: Preliminary studies for mask blanks and high-aspect-ratio absorber patterns
4. High aspect ratio ultrathick negative tone near UV photoresists and its application for MEMS
5. Combining microstereolithography and thick resist UV lithography for 3D microfabrication
6. Use of SU-8 photoresist for very high aspect ratio x-ray lithography
7. SU-8 resist and x-ray LIGA technique to produce 1mm high Ni gear wheel