Simulation of SU-8 photoresist profile in deep UV lithography

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 28, Issue 9, 2007, Pages 1465-1470

  Feng, Ming ^a   Huang, Qing'an ^a   Li, Weihua ^a   Zhou, Zaifa ^a   Zhu, Zhen ^a  

^a Southeast University   (China)

Author keywords

Development profile; Lithography simulation; SU 8 photoresist

Indexed keywords

DIFFRACTION; LIGHT ABSORPTION; LIGHT REFLECTION; LIGHT REFRACTION; MEMS;

ABSORPTION COEFFICIENT; DEVELOPMENT PROFILE; ENERGY LOSS; LITHOGRAPHY SIMULATION; SU-8 PHOTORESIST;

PHOTORESISTS;

EID: 35248844051     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

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