Layout decomposition for double patterning lithography

IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD

Volumn , Issue , 2008, Pages 465-472

  Kahng, Andrew B ^a,b   Park, Chul Hong ^b   Xu, Xu ^c   Yao, Hailong ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c Blaze DfM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

45NM TECHNOLOGIES; COLOR SPACINGS; CYCLE DETECTIONS; DESIGN RULES; DOUBLE PATTERNING; GRAPH CONSTRUCTIONS; LAYOUT DECOMPOSITIONS; LAYOUT FEATURES; PROCESS NODES; SPLITTING PROCESSES;

COLOR; COMPUTER AIDED DESIGN;

OPTICAL PROPERTIES;

EID: 57849119643     PISSN: 10923152     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICCAD.2008.4681616     Document Type: Conference Paper

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