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Volumn II, Issue , 2005, Pages 908-913

Bright-field AAPSM conflict detection and correction

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATING-APERTURE PHASE SHIFT MASKING (AAPSM); LAYOUT MODIFICATIONS; PHASE CONFLICTS;

EID: 33646922580     PISSN: 15301591     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/DATE.2005.84     Document Type: Conference Paper
Times cited : (10)

References (11)
  • 1
    • 0029512083 scopus 로고
    • Algorithms for phase-shift mask design with priority on shifter placement
    • A. Moniwa, T. Terasawa, N. Hasegawa and S. Okazaki, Algorithms for Phase-Shift Mask Design with Priority on Shifter Placement. In Jpn J. of App. Phys. 34, pages 6584-6589, 1993.
    • (1993) Jpn J. of App. Phys. , vol.34 , pp. 6584-6589
    • Moniwa, A.1    Terasawa, T.2    Hasegawa, N.3    Okazaki, S.4
  • 2
    • 0027814101 scopus 로고
    • Computer-aided design software for designing phase-shift masks
    • K. Ooi, S. Hara and K. Koyama. Computer-Aided Design Software for Designing Phase-Shift Masks, In Jpn J. of App. Phys. 32, pages 5887-5891, 1993.
    • (1993) Jpn J. of App. Phys. , vol.32 , pp. 5887-5891
    • Ooi, K.1    Hara, S.2    Koyama, K.3
  • 3
    • 0001347723 scopus 로고
    • Method of designing phase-shifting masks utilizing a compactor
    • K. Ooi, K. Koyama and M. Kiryu. Method of Designing Phase-Shifting Masks Utilizing a Compactor. In Jpn J. of App. Phys. 32, pages 6774-6778, 1994.
    • (1994) Jpn J. of App. Phys. , vol.32 , pp. 6774-6778
    • Ooi, K.1    Koyama, K.2    Kiryu, M.3
  • 4
    • 0029512083 scopus 로고
    • Heuristic method for phase-conflict minimization in automatic phase- shift mask design
    • A. Moniwa, T. Terasawa, K. Nakajo, J. Sakemi and S. Okazaki. Heuristic Method for Phase-Conflict Minimization in Automatic Phase- Shift Mask Design. In Jpn J. of App. Phys. 34, pages 6584-6589, 1995.
    • (1995) Jpn J. of App. Phys. , vol.34 , pp. 6584-6589
    • Moniwa, A.1    Terasawa, T.2    Nakajo, K.3    Sakemi, J.4    Okazaki, S.5
  • 5
    • 33646913450 scopus 로고    scopus 로고
    • Optimal phase conflict removal for layout of dark field alternating phase shifting masks
    • P. Berman, A.B. Kahng, S. Mantik, I.L. Markov and A. Zelikovsky. Optimal Phase Conflict Removal for Layout of Dark Field Alternating Phase Shifting Masks.. In IEEE TCAD (9), pages 1265-1278, 1999.
    • (1999) IEEE TCAD (9) , pp. 1265-1278
    • Berman, P.1    Kahng, A.B.2    Mantik, S.3    Markov, I.L.4    Zelikovsky, A.5
  • 6
    • 84949795280 scopus 로고    scopus 로고
    • New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
    • A.B. Kahng, S. Vaya and A. Zelikovsky. New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout. In ASP-DAC, pages 133-138, 2001.
    • (2001) ASP-DAC , pp. 133-138
    • Kahng, A.B.1    Vaya, S.2    Zelikovsky, A.3
  • 8
    • 0141499007 scopus 로고    scopus 로고
    • Full phase-shifting methodology for 65 nm node lithography
    • C. Pierrat, F.A. Driessen and G. Vandenberghe. Full phase-shifting methodology for 65 nm node lithography. In SPIE (5040), pages 282-293, 2003.
    • (2003) SPIE (5040) , pp. 282-293
    • Pierrat, C.1    Driessen, F.A.2    Vandenberghe, G.3
  • 9
    • 0242441066 scopus 로고    scopus 로고
    • PsmLint: Bringing Altpsm benefits to the 1I design stage
    • P. Ghosh, C. Kang, M. Sanie and J. Huckabay. PsmLint: Bringing Altpsm benefits to the 1I design stage. In SPIE (5042), pages 314-325, 2003.
    • (2003) SPIE (5042) , pp. 314-325
    • Ghosh, P.1    Kang, C.2    Sanie, M.3    Huckabay, J.4
  • 10
    • 2942677055 scopus 로고    scopus 로고
    • Hybrid AAPSM compliance methodology to ensure design for manufacturing
    • V.G. Kamat, A. Miloslavsky, V. Malhotra, J. Mayhew and M. Cote. Hybrid AAPSM compliance methodology to ensure design for manufacturing. In SPIE (5379), pages 279-289, 2004.
    • (2004) SPIE (5379) , pp. 279-289
    • Kamat, V.G.1    Miloslavsky, A.2    Malhotra, V.3    Mayhew, J.4    Cote, M.5
  • 11
    • 84939338348 scopus 로고
    • Multiple-valued minimization for PLA optimization
    • R. Rudell and A. Sangiovanni-Vincentelli. Multiple-valued minimization for PLA optimization. In IEEE TCAD(6(5)), pages 727-750, 1987.
    • (1987) IEEE TCAD(6(5)) , pp. 727-750
    • Rudell, R.1    Sangiovanni-Vincentelli, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.