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Volumn 2005, Issue , 2005, Pages 149-156

Fast and efficient phase conflict detection and correction in standard-cell layouts

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATING APERTURE PHASE SHIFT MASKING (AAPSM); CELL BLOCKS; LAYOUT MODIFICATION SCHEME; PHASE CONFLICT DETECTION; RESOLUTION ENHANCEMENT TECHNOLOGY (RET);

EID: 33751399217     PISSN: 10923152     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICCAD.2005.1560055     Document Type: Conference Paper
Times cited : (17)

References (13)
  • 1
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    • A comprehensive evaluation of major phase shift mask technologies for isolated gate structures in logic designs
    • L. W. Liebmann, T. H. Newman, R. A. Ferguson, R. M. Martino, A. F. Molless, M. O. Neisser, and J. T. Weed. A Comprehensive Evaluation of Major Phase Shift Mask Technologies for Isolated Gate Structures in Logic Designs. In SPIE (2197), pages 612-623, 1994.
    • (1994) SPIE , Issue.2197 , pp. 612-623
    • Liebmann, L.W.1    Newman, T.H.2    Ferguson, R.A.3    Martino, R.M.4    Molless, A.F.5    Neisser, M.O.6    Weed, J.T.7
  • 2
    • 33646922580 scopus 로고    scopus 로고
    • Bright-field AAPSM conflict detection and correction
    • C. Chiang, A. Kahng, S. Sinha, X. Xu and A. Zelikovsky. Bright-Field AAPSM Conflict Detection and Correction. In DATE, pages 908-913, 2005.
    • (2005) DATE , pp. 908-913
    • Chiang, C.1    Kahng, A.2    Sinha, S.3    Xu, X.4    Zelikovsky, A.5
  • 3
    • 0029512083 scopus 로고
    • Algorithms for phase-shift mask design with priority on shifter placement
    • A. Moniwa, T. Terasawa, N. Hasegawa and S. Okazaki. Algorithms for Phase-Shift Mask Design with Priority on Shifter Placement. In Jpn J. of App. Phys. 34, pages 6584-6589, 1993.
    • (1993) Jpn J. of App. Phys. , vol.34 , pp. 6584-6589
    • Moniwa, A.1    Terasawa, T.2    Hasegawa, N.3    Okazaki, S.4
  • 4
    • 0027814101 scopus 로고
    • Computer-aided design software for designing phase-shift masks
    • K. Ooi, S. Hara and K. Koyama. Computer-Aided Design Software for Designing Phase-Shift Masks. In Jpn J. of App. Phys. 32, pages 5887-5891, 1993.
    • (1993) Jpn J. of App. Phys. , vol.32 , pp. 5887-5891
    • Ooi, K.1    Hara, S.2    Koyama, K.3
  • 5
    • 33646913450 scopus 로고    scopus 로고
    • Optimal phase conflict removal for layout of dark field alternating phase shifting masks
    • P. Berman, A.B. Kahng, S. Mantik, I.L. Markov and A. Zelikovsky. Optimal Phase Conflict Removal for Layout of Dark Field Alternating Phase Shifting Masks.. In IEEE TCAD (9), pages 1265-1278, 1999.
    • (1999) IEEE TCAD , Issue.9 , pp. 1265-1278
    • Berman, P.1    Kahng, A.B.2    Mantik, S.3    Markov, I.L.4    Zelikovsky, A.5
  • 6
    • 84949795280 scopus 로고    scopus 로고
    • New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
    • A.B. Kahng, S. Vaya and A. Zelikovsky. New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout. In ASP-DAC, pages 133-138, 2001.
    • (2001) ASP-DAC , pp. 133-138
    • Kahng, A.B.1    Vaya, S.2    Zelikovsky, A.3
  • 7
    • 0141499007 scopus 로고    scopus 로고
    • Full phase-shifting methodology for 65 nm node lithography
    • C. Pierrat, F.A. Driessen and G. Vandenberghe. Full phase-shifting methodology for 65 nm node lithography. In SPIE (5040), pages 282-293, 2003.
    • (2003) SPIE , Issue.5040 , pp. 282-293
    • Pierrat, C.1    Driessen, F.A.2    Vandenberghe, G.3
  • 8
    • 0001347723 scopus 로고
    • Method of designing phase-shifting masks utilizing a compactor
    • K. Ooi, K. Koyama and M. Kiryu. Method of Designing Phase-Shifting Masks Utilizing a Compactor. In Jpn J. of App. Phys. 32, pages 6774-6778, 1994.
    • (1994) Jpn J. of App. Phys. , vol.32 , pp. 6774-6778
    • Ooi, K.1    Koyama, K.2    Kiryu, M.3
  • 9
    • 0029512083 scopus 로고
    • Heuristic method for phase-conflict minimization in automatic phase- shift mask design
    • A. Moniwa, T. Terasawa, K. Nakajo, J. Sakemi and S. Okazaki. Heuristic Method for Phase-Conflict Minimization in Automatic Phase- Shift Mask Design. In Jpn J. of App. Phys. 34, pages 6584-6589, 1995.
    • (1995) Jpn J. of App. Phys. , vol.34 , pp. 6584-6589
    • Moniwa, A.1    Terasawa, T.2    Nakajo, K.3    Sakemi, J.4    Okazaki, S.5
  • 10
    • 2942655169 scopus 로고    scopus 로고
    • Layout modification for library cell Alt-PSM composability
    • K. Cao, J. Hu and M. Cheng. Layout modification for library cell Alt-PSM composability. In SPIE, 2004.
    • (2004) SPIE
    • Cao, K.1    Hu, J.2    Cheng, M.3
  • 13
    • 0242441066 scopus 로고    scopus 로고
    • PsmLint: Bringing Altpsm benefits to the IC design stage
    • P. Ghosh, C. Kang, M. Sanie and J. Huckabay. PsmLint: Bringing Altpsm benefits to the IC design stage. In SPIE (5042), pages 314-325, 2003.
    • (2003) SPIE , Issue.5042 , pp. 314-325
    • Ghosh, P.1    Kang, C.2    Sanie, M.3    Huckabay, J.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.