Effect of Cr and V dopants on the chemical stability of AZO thin film

Applied Surface Science

Volumn 255, Issue 6, 2009, Pages 3629-3634

  Lin, Y C ^a   Jiang, J H ^a   Yen, W T ^a  

^a NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

Author keywords

AZO; Chemical stability; Doping; Pulsed DC magnetron sputtering; Transparent conducting oxide

Indexed keywords

ALUMINUM COMPOUNDS; CHLORINE COMPOUNDS; CHROMIUM; DOPING (ADDITIVES); ETCHING; MAGNETRON SPUTTERING; OPACITY; POTASSIUM HYDROXIDE; SEMICONDUCTOR DOPING; SURFACE ROUGHNESS; THIN FILMS; TRANSPARENT CONDUCTING OXIDES; ZINC COMPOUNDS;

AZO FILMS; AZO THIN FILMS; KOH ETCHING; KOH SOLUTION; OPTOELECTRONIC PROPERTIES; PULSED DC MAGNETRON SPUTTERING; RMS VALUES; V-DOPING;

CHEMICAL STABILITY;

EID: 57849083866     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.10.019     Document Type: Article

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