Film properties of ZnO:Al films deposited by co-sputtering of ZnO:Al and contaminated Zn targets with Co, Mn and Cr

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 511-515

  Tominaga, K ^a   Takao, T ^a   Fukushima, A ^a   Moriga, T ^a   Nakabayashi, I ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Annealing; Conductive transparent film; Impurity contamination; ZnO:Al

Indexed keywords

ANNEALING; CHROMIUM; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; INCLUSIONS; OXYGEN; SPUTTER DEPOSITION; THERMAL EFFECTS; TRANSPARENCY; ZINC OXIDE;

POLYCRYSTALLINE FILMS; TRANSPARENT FILMS;

CONDUCTIVE FILMS;

EID: 0037136148     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00124-0     Document Type: Article

References (5)