Low propagation loss SiN optical waveguide prepared by optimal low-hydrogen module

Optics Express

Volumn 16, Issue 25, 2008, Pages 20809-20816

  Mao, S C ^a,b,c   Tao, S H ^a   Xu, Y L ^c   Sun, X W ^a,b   Yu, M B ^a   Lo, G Q ^a   Kwong, D L ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; HYDROGEN; TEMPERATURE; WAVEGUIDES;

COMMUNICATIONS APPLICATIONS; HYDROGEN CONTENTS; LOW PROPAGATION LOSS; LOW TEMPERATURES; PHOTONICS INTEGRATED CIRCUITS; PROPAGATION LOSS; RADIO FREQUENCY POWER; WAVEGUIDE CROSS SECTION;

SILICON NITRIDE;

HYDROGEN; NANOMATERIAL; SILICON DERIVATIVE; SILICON NITRIDE;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; LIGHT; OPTICAL INSTRUMENTATION; RADIATION SCATTERING; THEORETICAL MODEL; ULTRASTRUCTURE;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HYDROGEN; LIGHT; MODELS, THEORETICAL; NANOSTRUCTURES; OPTICAL DEVICES; SCATTERING, RADIATION; SILICON COMPOUNDS;

EID: 57349190232     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.020809     Document Type: Article

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