Sulfur as a novel nanopatterning material: An ultrathin resist and a chemically addressable template for nanocrystal self-assembly

Advanced Materials

Volumn 20, Issue 23, 2008, Pages 4526-4529

  Germain, Jonathan ^a   Rolandi, Marco ^a,b   Backer, Scott A ^a   Fréchet, Jean M J ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; HYDROGEN; HYDROGEN PEROXIDE; MONOMERS; NANOCRYSTALLINE ALLOYS; NANOCRYSTALS; POLYMERS; SELF ASSEMBLY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS;

AMMONIUM FLUORIDES; ATOMIC FORCE MICROSCOPES; CHEMICAL FUNCTIONALITIES; CHEMICAL TEMPLATES; ETCH PROCESSES; ETCH TRANSFERS; GOLD NANOCRYSTALS; HIGH VELOCITIES; LITHOGRAPHIC PROCESSES; LOCALIZED POLYMERIZATIONS; NANOPATTERNING; NANOPATTERNS; NANOSCALE STRUCTURES; NANOSCOPIC OBJECTS; SILICON SUBSTRATES;

SULFUR;

EID: 57349165726     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200802024     Document Type: Article

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