High speed volumetric thickness profile measurement based on full-field wavelength scanning interferometer

Optics Express

Volumn 16, Issue 25, 2008, Pages 21022-21031

  You, Jang Woo ^a   Kim, Soohyun ^a   Kim, Daesuk ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETERS; LEAST SQUARES APPROXIMATIONS; MICHELSON INTERFEROMETERS; SIGNAL PROCESSING;

ACCURATE MEASUREMENT; LEAST SQUARE FITTING METHOD; PATTERN STRUCTURE; PHASE FUNCTIONS; REFERENCE PATH; SIGNAL PROCESSING ALGORITHMS; THICKNESS PROFILES; WAVELENGTH SCANNING;

FILM THICKNESS;

ARTICLE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; INTERFEROMETRY; LIGHT; MATERIALS TESTING; OPTICAL INSTRUMENTATION; RADIATION SCATTERING; REFRACTOMETRY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; THEORETICAL MODEL;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; INTERFEROMETRY; LIGHT; MATERIALS TESTING; MODELS, THEORETICAL; OPTICAL DEVICES; REFRACTOMETRY; REPRODUCIBILITY OF RESULTS; SCATTERING, RADIATION; SENSITIVITY AND SPECIFICITY;

EID: 57349095538     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.021022     Document Type: Article

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