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Volumn 26, Issue 6, 2008, Pages 2529-2533
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Three-dimensional alignment with 10 nm order accuracy in electron-beam lithography on rotated sample for three-dimensional nanofabrication
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Author keywords
[No Author keywords available]
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Indexed keywords
ALIGNMENT;
ESTERS;
HYDROGEN;
NANOSTRUCTURES;
THREE DIMENSIONAL;
3D ELECTRONS;
3D NANOFABRICATION;
3D NANOSTRUCTURES;
EB WRITINGS;
NANOFABRICATION;
POLIES (METHYL METHACRYLATE);
SILSESQUIOXANE;
STRUCTURAL FLEXIBILITIES;
TRANSMISSION ELECTRONS;
ELECTRON BEAM LITHOGRAPHY;
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EID: 57249086298
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2976600 Document Type: Article |
Times cited : (14)
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References (15)
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