Three-dimensional nanofabrication (3D-NANO) down to 10-NM order using electron-beam lithography

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 609-612

  Yamazaki, K ^a   Namatsu, H ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON SCATTERING; MACHINING; NANOTECHNOLOGY; POLYMERS; ROTATION;

ELECTRON-BEAM NANOLITHOGRAPHY; MICRON-ORDER RESOLUTION; NANOPILLARS; SEMICONDUCTOR FABRICATION;

LITHOGRAPHY;

EID: 3042779981     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

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2. K. -C. Lee, S. S. Lee, "3D fabrication using deep X-ray mask with integrated micro-actuator", in Proc. MEMS2003, Kyoto, Jan. 19-23, 2003, pp. 558-561.
3. S. Matsui, T. Kaito, J. Fujita, M. Komura, K. Kanda, Y. Haruyama, "Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition", J. Vac. Sci. Technol. B, vol. 18, pp. 3181-3184, 2000.
4. K. Yamazaki, H. Namatsu, "5-nm-order electron-beam lithography for nanodevices fabrication", in Digest of Papers Microprocess and Nanotechnology 2003, Tokyo, Oct. 28-31, 2003, and submitted to Jpn. J. Appl. Phys.
5. K. Yamazaki, H. Namatsu, "Two-axis-of-rotation drive system in e-beam lithography apparatus for nanotechnology applications", in Micro and Nano Engineering 2003 Abstract, Cambridge UK, Sep. 22-25, 2003, pp. 176-177, and submitted to Microelectron. Eng.
6. K. Kurihara, K. Iwadate, H. Namatsu, M. Nagase, H. Takenaka, K. Murase, "An electron beam nanolithography system and its application to Si nanofabrication", Jpn. J. Appl. Phys., vol. 34, pp. 6940-6966, 1995.