Fabrication of three dimensional structures for an UV curable nanoimprint lithography mold using variable dose control with critical-energy electron beam exposure

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2357-2360

  Mohamed, K ^a   Alkaisi, M M ^a   Blaikie, R J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

DOSIMETRY; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; PHOTORESISTS; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

DOSE CONTROL; QUARTZ MOLDS;

NANOIMPRINT LITHOGRAPHY;

EID: 37149018002     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2794317     Document Type: Article

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