New resist-coating technique using fine mist for three-dimensional nanotechnology

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn 2006, Issue , 2006, Pages 254-257

  Yamazaki, K ^a   Namatsu, H ^a,b  

^a NTT Basic Research Laboratories   (Japan)

^b NTT Advance Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FINE MIST; RESIST COATING TECHNIQUE; RESIST FILM;

COATING TECHNIQUES; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; LITHOGRAPHY; POLYMETHYL METHACRYLATES; SUBSTRATES; THREE DIMENSIONAL;

NANOTECHNOLOGY;

EID: 33750105019     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. K. Yamazaki, H. Namatsu, "Three-dimensional nanofabrication (3D-NANO) down to 10-nm order using electron-beam lithography", in Tech. Digest MEMS 2004, Maastricht, Jan. 25-29, 2004, pp. 609-612.
2. K. Yamazaki, H. Namatsu, "Two-axis-of-rotation drive system in e-beam lithography apparatus for nanotechnology applications", Microelectron. Eng., vol. 73-74, pp. 85-89, 2004.
3. K. Yamazaki, H. Namatsu, "Three-dimensional nanofabrication with 10-nm resolution", Jpn. J. Appl. Phys., vol. 43, pp. L1111-L1113, 2004.
4. Y. Joshima, T. Kokubo, T. Horiuchi, "Application of laser scan lithography to fabrication of microcylindrical parts", Jpn. J. Appl. Phys., vol. 43, pp. 4031-4035, 2004.
5. V. K. Singh, M. Sasaki, J. H. Song, K. Hane, "Heating effect on photoresist in spray coating technique for three-dimensional lithography", Jpn. J. Appl. Phys., vol. 42, pp. 4027-4030, 2003.
6. E. Lavallée, J. Beauvais, D. Drouin, P. Kelkar, P. Yang, D. Turcotte, M. Cloutier, R. Legario, "Evaporated electron beam lithography resist for non-planar surfaces", in Digest of Int. Microprocess and Nanotechnology Conf., Tokyo, Jan. 29-31, 2003, pp. 152-153
7. W. Mahoney, P. Roman, P. Mumbauer, J. Ruzyllo, "Mist deposition of thin photoresist films", in Proc. SPIE, Santa Clara, vol. 5376, pp. 861-866, 2004.
8. K. Yamazaki et al., preparing for submission.