Three-dimensional resist-coating technique and nanopatterning on a cube using electron-beam lithography and etching

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 12-16, 2006, Pages

  Yamazaki, Kenji ^a   Namatsu, Hideo ^a,b  

^a NTT Basic Research Laboratories   (Japan)

^b NTT Advance Technology Corporation   (Japan)

Author keywords

3D; EB nanolithography; PMMA; Resist coating; Silicon cube

Indexed keywords

ELECTRON BEAM MANDOLIN; NANOPATTERNING; OXIDE FILM; RESIST COATING; SILICON CUBE;

COATING TECHNIQUES; ETCHING; OPTICAL RESOLVING POWER; POLYMETHYL METHACRYLATES; SUBSTRATES;

ELECTRON BEAM LITHOGRAPHY;

EID: 33646472151     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L403     Document Type: Article

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