Influence of substrate doping on the surface chemistry and morphology of Copper Phthalocyanine ultra thin films on Si (111) substrates

Thin Solid Films

Volumn 517, Issue 5, 2009, Pages 1630-1635

  Krzywiecki, M ^a   Ottaviano, L ^b   Grzadziel, L ^a   Parisse, P ^b   Santucci, S ^b   Szuber, J ^a  

^a SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

Atomic force miscroscopy; Copper phthalocyanine; Organic Semiconductors; Surface properties; Thin films; X ray photoelectron spcetroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; COPPER; CRYSTALLITE SIZE; CRYSTALLITES; EMISSION SPECTROSCOPY; FILM GROWTH; LUMINESCENCE OF ORGANIC SOLIDS; NANOCRYSTALLINE ALLOYS; OXYGEN; PHOTOELECTRICITY; PHOTOEMISSION; SEMICONDUCTING ORGANIC COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON; SILICON COMPOUNDS; SURFACE CHEMISTRY; SURFACE MORPHOLOGY; SURFACE PROPERTIES; THEOREM PROVING; THICK FILMS; THIN FILMS; WATER VAPOR;

AMBIENT AIRS; ANGLE DEPENDENTS; AS GROWN; ATOMIC FORCE MISCROSCOPY; ATOMIC FORCES; COPPER PHTHALOCYANINE; COPPER PHTHALOCYANINE FILMS; COPPER PHTHALOCYANINES; CUPC FILMS; DOPED SI; GROWTH CONDITIONS; IN-SITU; MORPHOLOGICAL FEATURES; OPEN NETWORKS; ORGANIC FILMS; ORGANIC SEMICONDUCTORS; PHOTOEMISSION SPECTROSCOPIES; ROOM TEMPERATURES; ROOT MEAN SQUARE ROUGHNESSES; SI SUBSTRATES; SI(111); SI(111) SUBSTRATES; SIZE RANGES; SUBSTRATE DOPING; SUBSTRATE PLANES; SUBSTRATE ROUGHNESSES; ULTRA HIGHS; VOLUME EFFECTS; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPCETROSCOPY;

SUBSTRATES;

EID: 56949105542     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.09.099     Document Type: Article

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