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Thin Solid Films

Volumn 402, Issue 1-2, 2002, Pages 79-82

Copper phthalocyanine film grown by vacuum deposition under magnetic field

(5) Ji, Z G a,b Wong, K W a Tse, P K a Kwok, R W M a Lau, W M a

a CHINESE UNIVERSITY OF HONG KONG (Hong Kong)

b ZHEJIANG UNIVERSITY (China)

Author keywords

Atomic force microscopy (AFM); Deposition process; Organic semiconductors; Surface morphology; X Ray diffraction (XRD)

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETIC FIELD EFFECTS; MORPHOLOGY; SEMICONDUCTING ORGANIC COMPOUNDS; SURFACES; VACUUM; X RAY DIFFRACTION ANALYSIS;

VACUUM DEPOSITION;

FILM GROWTH;

EID: 0036149550 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01702-3 Document Type: Article

Times cited : (53)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.