Structure, morphology, and optical properties of thin films of F 16CuPc grown on silicon dioxide

Organic Electronics

Volumn 5, Issue 1-3, 2004, Pages 135-140

  Osso J O ^a,b   Schreiber, F ^c   Alonso, M I ^a   Garriga, M ^a   Barrena, E ^b   Dosch, H ^b,d  

^a INSTITUT DE CIÈNCIA DE MATERIALS DE BARCELONA ICMAB CSIC   (Spain)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c UNIVERSITY OF OXFORD   (United Kingdom)

^d UNIVERSITY OF STUTTGART   (Germany)

Author keywords

AFM; Crystalline structure; Optical properties; Organic thin films; Spectroscopic ellipsometry; X ray diffraction

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DEGREES OF FREEDOM (MECHANICS); ELLIPSOMETRY; EVAPORATION; OPTICAL PROPERTIES; SEMICONDUCTOR GROWTH; THERMAL EFFECTS; THIN FILMS; ULTRAHIGH VACUUM; X RAY DIFFRACTION;

CRYSTALLINE STRUCTURE; ORGANIC FIELD-EFFECT TRANSISTORS (OFET); ORGANIC THIN FILMS; SPECTROSCOPIC ELLIPSOMETRY;

SEMICONDUCTING ORGANIC COMPOUNDS;

EID: 2342458920     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2004.01.006     Document Type: Conference Paper

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