Hexadecafluoro-copper-phthalocyanine UHV deposited onto Si ( 111 ) 7 × 7 substrate: An XPS study

Surface Science

Volumn 402-404, Issue , 1998, Pages 518-522

  Ottaviano, L ^a   Lozzi, L ^a   Rispoli, F ^a   Santucci, S ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

Evaporation and sublimation; Low index single crystal surfaces; Photoelectron spectroscopy; Phthlocyanine; Silicon; Single crystal surfaces; Surface chemical reaction; X ray photoelectron spectroscopy

Indexed keywords

CHEMISORPTION; COPPER COMPOUNDS; DEPOSITION; EVAPORATION; FILM GROWTH; MOLECULAR STRUCTURE; ORGANOMETALLICS; SINGLE CRYSTALS; SUBLIMATION; ULTRATHIN FILMS; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

HEXADECAFLUORO COPPER PHTHALOCYANINE;

SILICON WAFERS;

EID: 0031633827     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00960-6     Document Type: Article

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