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Volumn 66, Issue 3-4, 2002, Pages 487-493
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ECR-plasma parameters and properties of thin DLC films
a
a
HITACHI LTD
(Japan)
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Author keywords
Carbon; CH4; CVD; DLC; ECR; Ion; Plasma; Radical
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ELECTRON CYCLOTRON RESONANCE;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ION BOMBARDMENT;
MAGNETIC FLUX;
METHANE;
PLASMAS;
RAMAN SPECTROSCOPY;
THIN FILMS;
ULTRAVIOLET SPECTROSCOPY;
FLUX DENSITIES;
DIAMOND LIKE CARBON FILMS;
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EID: 0037136090
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0042-207X(02)00120-3 Document Type: Article |
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Times cited : (13)
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References (14)
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