Water vapor adsorption effect on silica surface electrostatic patterning

Journal of Physical Chemistry C

Volumn 112, Issue 44, 2008, Pages 17193-17199

  Gouveia, Rubia F ^a   Costa, Carlos A R ^a   Galembeck, Fernando ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATMOSPHERIC ELECTRICITY; ATMOSPHERIC HUMIDITY; DEWATERING; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTROLYSIS; ELECTROSTATICS; ENVIRONMENTAL CHAMBERS; GAS ADSORPTION; IONIZATION OF GASES; IONIZATION OF LIQUIDS; IONIZATION POTENTIAL; METEOROLOGY; MOISTURE; OXIDES; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON; SILICON WAFERS; WATER VAPOR;

ATOMIC FORCE MICROSCOPES; CONTROLLED ATMOSPHERES; ELECTRIC POTENTIAL MEASUREMENTS; ELECTRODE POTENTIALS; ELECTROSTATIC CHARGING; ELECTROSTATIC PATTERNING; GAS INTERFACES; GOLD STRIPES; HIGH HUMIDITIES; INTERDIGITATED ELECTRODES; ION MIGRATIONS; KELVIN FORCE MICROSCOPES; KELVIN FORCES; KELVIN METHODS; LOW HUMIDITIES; NON CONTACTS; RELATIVE HUMIDITIES; SILICA SURFACES; SPATIAL RESOLUTIONS; SURFACE CONDUCTANCES; THIN SILICA FILMS; WATER ADSORPTIONS; WATER CLUSTERS; WATER VAPOR ADSORPTIONS;

PHASE INTERFACES;

EID: 56549083800     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp803812p     Document Type: Article

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