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Physical Review B - Condensed Matter and Materials Physics

Volumn 69, Issue 19, 2004, Pages

H2O and O2 molecules in amorphous SiO2: Defect formation and annihilation mechanisms

(3) Bakos, T a,c Rashkeev, S N a Pantelides, S T a,b

a VANDERBILT UNIVERSITY (United States)

b OAK RIDGE NATIONAL LABORATORY (United States)

c University of Massachusetts Amherst (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN; SILICON DIOXIDE; WATER;

ARTICLE; ENERGY; FILM; MOLECULAR DYNAMICS; MOLECULAR MECHANICS; MOLECULAR STABILITY; REACTION ANALYSIS; TEMPERATURE SENSE; THERMAL ANALYSIS; VACUUM;

EID: 42749099226 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevB.69.195206 Document Type: Article

Times cited : (99)

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