Modification of electrode materials for plasma torches

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 254-257

  Jankov, I R ^a,f   Szente, R N ^b,e   Goldman, I D ^a   Carreno M N P ^a   Valle, M A ^a   Behar, M ^c   Costa, C A R ^d   Galembeck, F ^d   Landers, R ^d  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b Instituto de Pesquisas Tecnologicas   (Brazil)

^c FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^d UNIVERSITY OF CAMPINAS   (Brazil)

^e NONE   (Brazil)

^f NONE   (Brazil)

Author keywords

Ion implantation; Plasma torches; Work function

Indexed keywords

CHEMICAL MODIFICATION; COMPOSITION; DEPOSITION; ELECTRODES; ION IMPLANTATION; METALLIC FILMS; PLASMA TORCHES; POLYCRYSTALLINE MATERIALS; SILICON WAFERS; SURFACE PROPERTIES;

COPPER THIN FILM SUBSTRATES; ELECTRODE MATERIALS; ELECTRON BEAM TECHNIQUE; WORK FUNCTION;

COPPER;

ION IMPLANTATION;

EID: 24644495675     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.015     Document Type: Article

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