Nonuniform structural degradation in porous organosilicate films exposed to plasma, etching, and ashing as characterized by x-ray porosimetry

Applied Physics Letters

Volumn 91, Issue 17, 2007, Pages

  Lee, Hae Jeong ^a   Soles, Christopher L ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Liu, Youfan ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; PLASMA ETCHING; PORE SIZE; POROSIMETERS; SILICATES; X RAY OPTICS;

FILM DENSITY; INTERLAYER DIELECTRICS; ORGANOSILICATE FILMS; X-RAY POROSIMETRY;

OPTICAL FILMS;

EID: 35548979452     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2800376     Document Type: Article

References (11)

1. K. Yonekura, S. Sakamori, K. Goto, M. Matsuura, N. Fujiwara, and M. Yoneda, J. Vac. Sci. Technol. B 22, 548 (2004).
2. A. Sankaran and M. Kushner, Appl. Phys. Lett. 82, 1824 (2003).
3. C. L. Wang, M. H. Weber, and K. G. Lynn, J. Appl. Phys. 99, 113514 (2006).
4. J. N. Sun, D. W. Gidley, Y. Hu, W. E. Frieze, and E. T. Ryan, Appl. Phys. Lett. 81, 1447 (2002).
5. M. T. Othman, J. A. Lubguban, A. A. Lubguban, S. Gangopadhyay, R. D. Miller, W. Volksen, and H. C. Kim, J. Appl. Phys. 99, 083503 (2006).
6. H. J. Lee, E. K. Lin, B. J. Bauer, W. L. Wu, B. K. Hwang, and W. D. Gray, Appl. Phys. Lett. 82, 1084 (2003).
7. H. J. Lee, C. L. Soles, D. W. Liu, B. J. Bauer, E. K. Lin, W. L. Wu, and A. Grill, J. Appl. Phys. 95, 2355 (2004).
8. W. L. Wu, W. E. Wallace, E. K. Lin, G. W. Lynn, C. J. Glinka, E. T. Ryan, H. M. Ho, J. Appl. Phys. 87, 1193 (2000).
9. C. E. Bouldin, W. E. Wallace, G. W. Lynn, S. C. Roth, and W. L. Wu, J. Appl. Phys. 88, 961 (2000).
10. L. G. Parratt, Phys. Rev. 95, 359 (1954).
11. X. Hua, M. Kuo, G. S. Oehrlein, P. Lazzeri, E. Lacob, M. Anderle, C. K. Inoki, T. S. Kuan, P. Jiang, and W. L. Wu, J. Vac. Sci. Technol. B 24, 1238 (2006).