Evolution of microstructure and surface bonding in SiO2 aerogel film after plasma treatment using O2, N2, and H2 gases

Thin Solid Films

Volumn 384, Issue 2, 2001, Pages 236-242

  Kim, Jean Jong ^a   Park, Hyung Ho ^a   Hyun, Sang Hoon ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AEROGELS; CHEMICAL BONDS; CRYSTAL MICROSTRUCTURE; HYDROGEN; NITROGEN; OXYGEN; PLASMAS; SILICA; ULTRAVIOLET RADIATION; VACUUM;

INTERMETAL DIELECTRICS (IMD);

DIELECTRIC FILMS;

EID: 0034836136     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01827-7     Document Type: Article

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