Enhanced reflectivity and stability of high-temperature LPP collector mirrors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7077, Issue , 2008, Pages

  Feigl, Torsten ^a   Yulin, Sergiy ^a   Perske, Marco ^a   Pauer, Hagen ^a   Schürmann, Mark ^a   Kaiser, Norbert ^a   Böwering, Norbert R ^b   Khodykin, Oleg V ^b   Fomenkov, Igor V ^b   Brandt, David C ^b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b CYMER INC   (United States)

Author keywords

Collector lifetime; EUV collector mirror; Multilayer mirror coatings; Optics lifetime; Thermal stability

Indexed keywords

ANNEALING; COATED MATERIALS; COATINGS; HEATING; LIGHT; LITHOGRAPHY; MIRRORS; MOLYBDENUM; OPTICAL MATERIALS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SUBSTRATES; SURFACE ROUGHNESS; SYSTEM STABILITY; THERMODYNAMIC STABILITY; ULTRAVIOLET DEVICES;

ANNEALING CYCLES; COLLECTOR LIFETIME; COLLECTOR OPTICS; DIFFERENT SUBSTRATES; ELEVATED TEMPERATURES; ELLIPSOIDAL MIRRORS; EUV COLLECTOR MIRROR; EUV LITHOGRAPHIES; HEATING TESTS; HEATING UP; HIGH TEMPERATURES; INCIDENCE REFLECTANCES; INTERDIFFUSION PROCESSES; LIFE-TIMES; MEASUREMENT POINTS; MIRROR COATINGS; MO/SI MULTILAYERS; MULTILAYER COATINGS; MULTILAYER MIRROR COATINGS; OPTICAL STABILITIES; OUTER DIAMETERS; OUTPUT POWERS; PEAK REFLECTIVITIES; PEAK VALUES; POLARIZED LIGHTS; RECENT DEVELOPMENTS; SI WAFERS; THERMAL STABILITIES; THERMAL STABILITY; THIN BARRIER LAYERS; UNPOLARIZED LIGHTS; WORKING TEMPERATURES;

MULTILAYERS;

EID: 56249110604     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.802322     Document Type: Conference Paper

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