EUV Source collector

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Böwering, Norbert R ^a   Ershov, Alex I ^a   Marx, William F ^a   Khodykin, Oleh V ^a   Hansson, Björn A M ^a   Ernesto Vargas, L ^a   Chavez, Juan A ^a   Fomenkov, Igor V ^a   Myers, David W ^a   Brandt, David C ^a  

^a CYMER INC   (United States)

Author keywords

Collector lifetime; EUV collector mirror; EUV light source; EUV lithography; EUV radiation power; Laser produced plasma; Multilayer mirror

Indexed keywords

IMAGING SYSTEMS; LASER PRODUCED PLASMAS; LIGHT SOURCES; MIRRORS; MULTILAYERS; THERMAL EFFECTS;

COLLECTOR LIFETIME; EUV COLLECTOR MIRRORS; EUV LIGHT SOURCES; EUV LITHOGRAPHY; EUV RADIATION POWER; MULTILAYER MIRRORS;

ULTRAVIOLET RADIATION;

EID: 33745587523     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656462     Document Type: Conference Paper

References (8)

1. D. W. Myers, I. V. Fomenkov, B. A. M. Hansson, B. C. Kiene, D. C. Brandt, in: Proc. of SPIE Vol. 5751, Emerging Lithographic Technologies IX, R. S. Mackay, Ed., 248-259 (2005).
2. B. A. M. Hansson, I. V. Fomenkov, N. R. Böwering, A. I. Ershov, W. N. Partlo, D. W. Myers, O. V. Khodykin, A. N. Bykanov, C. L. Rettig, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, W. F. Marx, D. C. Brandt, in: These Proceedings, SPIE Vol. 6151, Emerging Lithographic Technologies X, (2006).
3. J. M. Algots, O. Hemberg, A. Bykanov, in: Proc. of SPIE Vol. 5751, Emerging Lithographic Technologies IX, R. S. Mackay, Ed., 885-891 (2005).
4. D. A. Tichenor et al., in: Proc. of SPIE Vol. 4343, Emerging Lithographic Technologies V, E. A. Dobisz, Ed., 19-37 (2001).
5. R. J. Andersen, D. A. Buchenauer, L. Klebanoff, O. R. Wood II N. V. Edwards, Proc. of SPIE Vol. 5374, Emerging Lithographic Technologies VIII, R. S. Mackay, Ed., 710-719 (2004).
6. S. Yulin, N. Benoit, T. Feigl, N. Kaiser, in: Proc. of SPIE Vol. 5751, Emerging Lithographic Technologies IX, R. S. Mackay, Ed., 1155-1161 (2005).
7. J. Tümmler, H. Blume, G. Brandt, J. Eden, B. Meyer, H. Scherr, F. Scholz, F. Scholze, G.Ulm, in: Proc. of SPIE Vol. 5037, Emerging Lithographic Technologies VII, R. L. Engelstad, Ed., 265-273 (2003).
8. C. L. Rettig, O. V. Khodykin, J. R. Hoffman, W. F. Marx, N. R. Böwering, E. Vargas, A. I. Ershov, I. V. Fomenkov, W. N. Partlo, in: Proc. of SPIE Vol. 5751, Emerging Lithographic Technologies IX, R. S. Mackay, Ed., 910-918 (2005).